Improvement of voltage linearity in high-κ MIM capacitors using HfO2-SiO2 stacked dielectric

Improvement of voltage linearity in high-κ MIM capacitors using HfO2-SiO2 stacked dielectric

10.1109/LED.2004.832785

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Bibliographic Details
Main Authors:	Kim, S.J., Cho, B.J., Li, M.-F., Ding, S.-J., Zhu, C., Yu, M.B., Narayanan, B., Chin, A., Kwong, D.-L.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/82510
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Institution:	National University of Singapore

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