Integrated high-κ (κ ∼ 19) MIM capacitor with Cu/ low-κ interconnects for RF application

10.1109/LED.2005.857694

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Bibliographic Details
Main Authors:	Yu, M.B., Xiong, Y.Z., Kim, S.-J., Balakumar, S., Zhu, C., Li, M.-F., Cho, B.-J., Lo, G.Q., Balasubramanian, N., Kwong, D.-L.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Subjects:	Cu/low-κ backend High-κ Metal-insulator-metal (MIM) capacitor Radio frequency (RF) application Resonant frequency
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/82546
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-82546
record_format	dspace
spelling	sg-nus-scholar.10635-825462024-11-14T01:24:50Z Integrated high-κ (κ ∼ 19) MIM capacitor with Cu/ low-κ interconnects for RF application Yu, M.B. Xiong, Y.Z. Kim, S.-J. Balakumar, S. Zhu, C. Li, M.-F. Cho, B.-J. Lo, G.Q. Balasubramanian, N. Kwong, D.-L. ELECTRICAL & COMPUTER ENGINEERING Cu/low-κ backend High-κ Metal-insulator-metal (MIM) capacitor Radio frequency (RF) application Resonant frequency 10.1109/LED.2005.857694 IEEE Electron Device Letters 26 11 793-795 EDLED 2014-10-07T04:30:39Z 2014-10-07T04:30:39Z 2005-11 Article Yu, M.B., Xiong, Y.Z., Kim, S.-J., Balakumar, S., Zhu, C., Li, M.-F., Cho, B.-J., Lo, G.Q., Balasubramanian, N., Kwong, D.-L. (2005-11). Integrated high-κ (κ ∼ 19) MIM capacitor with Cu/ low-κ interconnects for RF application. IEEE Electron Device Letters 26 (11) : 793-795. ScholarBank@NUS Repository. https://doi.org/10.1109/LED.2005.857694 07413106 http://scholarbank.nus.edu.sg/handle/10635/82546 000232821500005 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Cu/low-κ backend High-κ Metal-insulator-metal (MIM) capacitor Radio frequency (RF) application Resonant frequency
spellingShingle	Cu/low-κ backend High-κ Metal-insulator-metal (MIM) capacitor Radio frequency (RF) application Resonant frequency Yu, M.B. Xiong, Y.Z. Kim, S.-J. Balakumar, S. Zhu, C. Li, M.-F. Cho, B.-J. Lo, G.Q. Balasubramanian, N. Kwong, D.-L. Integrated high-κ (κ ∼ 19) MIM capacitor with Cu/ low-κ interconnects for RF application
description	10.1109/LED.2005.857694
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Yu, M.B. Xiong, Y.Z. Kim, S.-J. Balakumar, S. Zhu, C. Li, M.-F. Cho, B.-J. Lo, G.Q. Balasubramanian, N. Kwong, D.-L.
format	Article
author	Yu, M.B. Xiong, Y.Z. Kim, S.-J. Balakumar, S. Zhu, C. Li, M.-F. Cho, B.-J. Lo, G.Q. Balasubramanian, N. Kwong, D.-L.
author_sort	Yu, M.B.
title	Integrated high-κ (κ ∼ 19) MIM capacitor with Cu/ low-κ interconnects for RF application
title_short	Integrated high-κ (κ ∼ 19) MIM capacitor with Cu/ low-κ interconnects for RF application
title_full	Integrated high-κ (κ ∼ 19) MIM capacitor with Cu/ low-κ interconnects for RF application
title_fullStr	Integrated high-κ (κ ∼ 19) MIM capacitor with Cu/ low-κ interconnects for RF application
title_full_unstemmed	Integrated high-κ (κ ∼ 19) MIM capacitor with Cu/ low-κ interconnects for RF application
title_sort	integrated high-κ (κ ∼ 19) mim capacitor with cu/ low-κ interconnects for rf application
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/82546
_version_	1821194114163539968

Integrated high-κ (κ ∼ 19) MIM capacitor with Cu/ low-κ interconnects for RF application

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