Integrated high-κ (κ ∼ 19) MIM capacitor with Cu/ low-κ interconnects for RF application

• Main Authors: Yu, M.B., Xiong, Y.Z., Kim, S.-J., Balakumar, S., Zhu, C., Li, M.-F., Cho, B.-J., Lo, G.Q., Balasubramanian, N., Kwong, D.-L.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Article
• Published: 2014
• Subjects: Cu/low-κ backend; High-κ; Metal-insulator-metal (MIM) capacitor; Radio frequency (RF) application; Resonant frequency
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/82546
• Institution: National University of Singapore

10.1109/LED.2005.857694