Performance Improvement of Sm2O3 MIM capacitors by using plasma treatment after dielectric formation

Performance Improvement of Sm2O3 MIM capacitors by using plasma treatment after dielectric formation

10.1109/LED.2009.2030750

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Bibliographic Details
Main Authors: Yang, J.-J., Chen, J.-D., Wise, R., Yeo, Y.-C., Zhu, C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Capacitor
Linear
Metal-insulator-metal (mim)
Plasma treatment (pt)
Quadratic
Sm2o3
Voltage coefficient of capacitance (vcc)
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82878
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/82878

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