Performance Improvement of Sm2O3 MIM capacitors by using plasma treatment after dielectric formation

• Main Authors: Yang, J.-J., Chen, J.-D., Wise, R., Yeo, Y.-C., Zhu, C.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Article
• Published: 2014
• Subjects: Capacitor; Linear; Metal-insulator-metal (mim); Plasma treatment (pt); Quadratic; Sm2o3; Voltage coefficient of capacitance (vcc)
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/82878
• Institution: National University of Singapore

10.1109/LED.2009.2030750