Performance Improvement of Sm2O3 MIM capacitors by using plasma treatment after dielectric formation

10.1109/LED.2009.2030750

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Bibliographic Details
Main Authors:	Yang, J.-J., Chen, J.-D., Wise, R., Yeo, Y.-C., Zhu, C.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Subjects:	Capacitor Linear Metal-insulator-metal (mim) Plasma treatment (pt) Quadratic Sm2o3 Voltage coefficient of capacitance (vcc)
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/82878
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Institution:	National University of Singapore

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record_format	dspace
spelling	sg-nus-scholar.10635-828782023-10-29T22:25:17Z Performance Improvement of Sm2O3 MIM capacitors by using plasma treatment after dielectric formation Yang, J.-J. Chen, J.-D. Wise, R. Yeo, Y.-C. Zhu, C. ELECTRICAL & COMPUTER ENGINEERING Capacitor Linear Metal-insulator-metal (mim) Plasma treatment (pt) Quadratic Sm2o3 Voltage coefficient of capacitance (vcc) 10.1109/LED.2009.2030750 IEEE Electron Device Letters 30 10 1033-1035 EDLED 2014-10-07T04:34:34Z 2014-10-07T04:34:34Z 2009-10 Article Yang, J.-J., Chen, J.-D., Wise, R., Yeo, Y.-C., Zhu, C. (2009-10). Performance Improvement of Sm2O3 MIM capacitors by using plasma treatment after dielectric formation. IEEE Electron Device Letters 30 (10) : 1033-1035. ScholarBank@NUS Repository. https://doi.org/10.1109/LED.2009.2030750 07413106 http://scholarbank.nus.edu.sg/handle/10635/82878 000270227600007 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Capacitor Linear Metal-insulator-metal (mim) Plasma treatment (pt) Quadratic Sm2o3 Voltage coefficient of capacitance (vcc)
spellingShingle	Capacitor Linear Metal-insulator-metal (mim) Plasma treatment (pt) Quadratic Sm2o3 Voltage coefficient of capacitance (vcc) Yang, J.-J. Chen, J.-D. Wise, R. Yeo, Y.-C. Zhu, C. Performance Improvement of Sm2O3 MIM capacitors by using plasma treatment after dielectric formation
description	10.1109/LED.2009.2030750
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Yang, J.-J. Chen, J.-D. Wise, R. Yeo, Y.-C. Zhu, C.
format	Article
author	Yang, J.-J. Chen, J.-D. Wise, R. Yeo, Y.-C. Zhu, C.
author_sort	Yang, J.-J.
title	Performance Improvement of Sm2O3 MIM capacitors by using plasma treatment after dielectric formation
title_short	Performance Improvement of Sm2O3 MIM capacitors by using plasma treatment after dielectric formation
title_full	Performance Improvement of Sm2O3 MIM capacitors by using plasma treatment after dielectric formation
title_fullStr	Performance Improvement of Sm2O3 MIM capacitors by using plasma treatment after dielectric formation
title_full_unstemmed	Performance Improvement of Sm2O3 MIM capacitors by using plasma treatment after dielectric formation
title_sort	performance improvement of sm2o3 mim capacitors by using plasma treatment after dielectric formation
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/82878
_version_	1781784243404275712

Performance Improvement of Sm2O3 MIM capacitors by using plasma treatment after dielectric formation

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