Laser-induced titanium disilicide formation for submicron technologies

Journal of Electronic Materials

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Bibliographic Details
Main Authors:	Chong, Y.F., Pey, K.L., Wee, A.T.S., See, A., Shen, Z.X., Tung, C.-H., Gopalakrishnan, R., Lu, Y.F.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Subjects:	Laser annealing Rapid thermal annealing Titanium disilicide
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/82610
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Institution:	National University of Singapore

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