Localized oxide degradation in ultrathin gate dielectric and its statistical analysis

10.1109/TED.2003.812105

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Bibliographic Details
Main Authors:	Loh, W.Y., Cho, B.J., Li, M.F., Chan, D.S.H., Ang, C.H., Zheng, J.Z., Kwong, D.L.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Subjects:	Gate leakage current Oxide degradation Reliability Tunneling Ultrathin gate oxide
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/82623
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-82623
record_format	dspace
spelling	sg-nus-scholar.10635-826232023-10-30T08:08:06Z Localized oxide degradation in ultrathin gate dielectric and its statistical analysis Loh, W.Y. Cho, B.J. Li, M.F. Chan, D.S.H. Ang, C.H. Zheng, J.Z. Kwong, D.L. ELECTRICAL & COMPUTER ENGINEERING Gate leakage current Oxide degradation Reliability Tunneling Ultrathin gate oxide 10.1109/TED.2003.812105 IEEE Transactions on Electron Devices 50 4 967-972 IETDA 2014-10-07T04:31:33Z 2014-10-07T04:31:33Z 2003-04 Article Loh, W.Y., Cho, B.J., Li, M.F., Chan, D.S.H., Ang, C.H., Zheng, J.Z., Kwong, D.L. (2003-04). Localized oxide degradation in ultrathin gate dielectric and its statistical analysis. IEEE Transactions on Electron Devices 50 (4) : 967-972. ScholarBank@NUS Repository. https://doi.org/10.1109/TED.2003.812105 00189383 http://scholarbank.nus.edu.sg/handle/10635/82623 000183821800016 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Gate leakage current Oxide degradation Reliability Tunneling Ultrathin gate oxide
spellingShingle	Gate leakage current Oxide degradation Reliability Tunneling Ultrathin gate oxide Loh, W.Y. Cho, B.J. Li, M.F. Chan, D.S.H. Ang, C.H. Zheng, J.Z. Kwong, D.L. Localized oxide degradation in ultrathin gate dielectric and its statistical analysis
description	10.1109/TED.2003.812105
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Loh, W.Y. Cho, B.J. Li, M.F. Chan, D.S.H. Ang, C.H. Zheng, J.Z. Kwong, D.L.
format	Article
author	Loh, W.Y. Cho, B.J. Li, M.F. Chan, D.S.H. Ang, C.H. Zheng, J.Z. Kwong, D.L.
author_sort	Loh, W.Y.
title	Localized oxide degradation in ultrathin gate dielectric and its statistical analysis
title_short	Localized oxide degradation in ultrathin gate dielectric and its statistical analysis
title_full	Localized oxide degradation in ultrathin gate dielectric and its statistical analysis
title_fullStr	Localized oxide degradation in ultrathin gate dielectric and its statistical analysis
title_full_unstemmed	Localized oxide degradation in ultrathin gate dielectric and its statistical analysis
title_sort	localized oxide degradation in ultrathin gate dielectric and its statistical analysis
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/82623
_version_	1781784185041584128

Localized oxide degradation in ultrathin gate dielectric and its statistical analysis

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