Process and material properties of HfLaOx prepared by atomic layer deposition

10.1149/1.2960995

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Bibliographic Details
Main Authors:	He, W., Chan, D.S.H., Kim, S.-J., Kim, Y.-S., Kim, S.-T., Cho, B.J.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/82934
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Institution:	National University of Singapore

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spelling	sg-nus-scholar.10635-829342023-10-27T07:14:57Z Process and material properties of HfLaOx prepared by atomic layer deposition He, W. Chan, D.S.H. Kim, S.-J. Kim, Y.-S. Kim, S.-T. Cho, B.J. ELECTRICAL & COMPUTER ENGINEERING 10.1149/1.2960995 Journal of the Electrochemical Society 155 10 G189-G193 JESOA 2014-10-07T04:35:15Z 2014-10-07T04:35:15Z 2008 Article He, W., Chan, D.S.H., Kim, S.-J., Kim, Y.-S., Kim, S.-T., Cho, B.J. (2008). Process and material properties of HfLaOx prepared by atomic layer deposition. Journal of the Electrochemical Society 155 (10) : G189-G193. ScholarBank@NUS Repository. https://doi.org/10.1149/1.2960995 00134651 http://scholarbank.nus.edu.sg/handle/10635/82934 000258976500048 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1149/1.2960995
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING He, W. Chan, D.S.H. Kim, S.-J. Kim, Y.-S. Kim, S.-T. Cho, B.J.
format	Article
author	He, W. Chan, D.S.H. Kim, S.-J. Kim, Y.-S. Kim, S.-T. Cho, B.J.
spellingShingle	He, W. Chan, D.S.H. Kim, S.-J. Kim, Y.-S. Kim, S.-T. Cho, B.J. Process and material properties of HfLaOx prepared by atomic layer deposition
author_sort	He, W.
title	Process and material properties of HfLaOx prepared by atomic layer deposition
title_short	Process and material properties of HfLaOx prepared by atomic layer deposition
title_full	Process and material properties of HfLaOx prepared by atomic layer deposition
title_fullStr	Process and material properties of HfLaOx prepared by atomic layer deposition
title_full_unstemmed	Process and material properties of HfLaOx prepared by atomic layer deposition
title_sort	process and material properties of hflaox prepared by atomic layer deposition
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/82934
_version_	1781784255866601472

Process and material properties of HfLaOx prepared by atomic layer deposition

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