Process and material properties of HfLaOx prepared by atomic layer deposition

10.1149/1.2960995

Saved in:
Bibliographic Details
Main Authors: He, W., Chan, D.S.H., Kim, S.-J., Kim, Y.-S., Kim, S.-T., Cho, B.J.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82934
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore

Similar Items