PVD HfO2 for high-precision MIM capacitor applications
10.1109/LED.2003.813381
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sg-nus-scholar.10635-829502023-10-29T22:24:39Z PVD HfO2 for high-precision MIM capacitor applications Kim, S.J. Cho, B.J. Li, M.F. Yu, X. Zhu, C. Chin, A. Kwong, D.-L. ELECTRICAL & COMPUTER ENGINEERING Capacitance density HfO2 Metal-insulator-metal (MIM) capacitor Sputter Voltage coefficient of capacitor (VCC) 10.1109/LED.2003.813381 IEEE Electron Device Letters 24 6 387-389 EDLED 2014-10-07T04:35:26Z 2014-10-07T04:35:26Z 2003-06 Article Kim, S.J., Cho, B.J., Li, M.F., Yu, X., Zhu, C., Chin, A., Kwong, D.-L. (2003-06). PVD HfO2 for high-precision MIM capacitor applications. IEEE Electron Device Letters 24 (6) : 387-389. ScholarBank@NUS Repository. https://doi.org/10.1109/LED.2003.813381 07413106 http://scholarbank.nus.edu.sg/handle/10635/82950 000184254700007 Scopus |
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Capacitance density HfO2 Metal-insulator-metal (MIM) capacitor Sputter Voltage coefficient of capacitor (VCC) |
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Capacitance density HfO2 Metal-insulator-metal (MIM) capacitor Sputter Voltage coefficient of capacitor (VCC) Kim, S.J. Cho, B.J. Li, M.F. Yu, X. Zhu, C. Chin, A. Kwong, D.-L. PVD HfO2 for high-precision MIM capacitor applications |
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10.1109/LED.2003.813381 |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Kim, S.J. Cho, B.J. Li, M.F. Yu, X. Zhu, C. Chin, A. Kwong, D.-L. |
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Article |
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Kim, S.J. Cho, B.J. Li, M.F. Yu, X. Zhu, C. Chin, A. Kwong, D.-L. |
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Kim, S.J. |
title |
PVD HfO2 for high-precision MIM capacitor applications |
title_short |
PVD HfO2 for high-precision MIM capacitor applications |
title_full |
PVD HfO2 for high-precision MIM capacitor applications |
title_fullStr |
PVD HfO2 for high-precision MIM capacitor applications |
title_full_unstemmed |
PVD HfO2 for high-precision MIM capacitor applications |
title_sort |
pvd hfo2 for high-precision mim capacitor applications |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/82950 |
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