Scaling of flat band potential and dielectric constant as a function of Ta concentration in Ta-TiO2 epitaxial films
10.1063/1.3609927
Saved in:
Main Authors: | , , , , , , , , , |
---|---|
Other Authors: | |
Format: | Article |
Published: |
2014
|
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/82995 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
id |
sg-nus-scholar.10635-82995 |
---|---|
record_format |
dspace |
spelling |
sg-nus-scholar.10635-829952023-10-30T07:10:27Z Scaling of flat band potential and dielectric constant as a function of Ta concentration in Ta-TiO2 epitaxial films Zhao, Y.L. Barman, A.R. Dhar, S. Annadi, A. Motapothula, M. Wang, J. Su, H. Breese, M. Venkatesan, T. Wang, Q. PHYSICS ELECTRICAL & COMPUTER ENGINEERING MATERIALS SCIENCE AND ENGINEERING 10.1063/1.3609927 AIP Advances 1 2 - 2014-10-07T04:35:59Z 2014-10-07T04:35:59Z 2011 Article Zhao, Y.L., Barman, A.R., Dhar, S., Annadi, A., Motapothula, M., Wang, J., Su, H., Breese, M., Venkatesan, T., Wang, Q. (2011). Scaling of flat band potential and dielectric constant as a function of Ta concentration in Ta-TiO2 epitaxial films. AIP Advances 1 (2) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.3609927 21583226 http://scholarbank.nus.edu.sg/handle/10635/82995 000302137000049 Scopus |
institution |
National University of Singapore |
building |
NUS Library |
continent |
Asia |
country |
Singapore Singapore |
content_provider |
NUS Library |
collection |
ScholarBank@NUS |
description |
10.1063/1.3609927 |
author2 |
PHYSICS |
author_facet |
PHYSICS Zhao, Y.L. Barman, A.R. Dhar, S. Annadi, A. Motapothula, M. Wang, J. Su, H. Breese, M. Venkatesan, T. Wang, Q. |
format |
Article |
author |
Zhao, Y.L. Barman, A.R. Dhar, S. Annadi, A. Motapothula, M. Wang, J. Su, H. Breese, M. Venkatesan, T. Wang, Q. |
spellingShingle |
Zhao, Y.L. Barman, A.R. Dhar, S. Annadi, A. Motapothula, M. Wang, J. Su, H. Breese, M. Venkatesan, T. Wang, Q. Scaling of flat band potential and dielectric constant as a function of Ta concentration in Ta-TiO2 epitaxial films |
author_sort |
Zhao, Y.L. |
title |
Scaling of flat band potential and dielectric constant as a function of Ta concentration in Ta-TiO2 epitaxial films |
title_short |
Scaling of flat band potential and dielectric constant as a function of Ta concentration in Ta-TiO2 epitaxial films |
title_full |
Scaling of flat band potential and dielectric constant as a function of Ta concentration in Ta-TiO2 epitaxial films |
title_fullStr |
Scaling of flat band potential and dielectric constant as a function of Ta concentration in Ta-TiO2 epitaxial films |
title_full_unstemmed |
Scaling of flat band potential and dielectric constant as a function of Ta concentration in Ta-TiO2 epitaxial films |
title_sort |
scaling of flat band potential and dielectric constant as a function of ta concentration in ta-tio2 epitaxial films |
publishDate |
2014 |
url |
http://scholarbank.nus.edu.sg/handle/10635/82995 |
_version_ |
1781784270612725760 |