Scaling of flat band potential and dielectric constant as a function of Ta concentration in Ta-TiO2 epitaxial films

10.1063/1.3609927

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Main Authors: Zhao, Y.L., Barman, A.R., Dhar, S., Annadi, A., Motapothula, M., Wang, J., Su, H., Breese, M., Venkatesan, T., Wang, Q.
Other Authors: PHYSICS
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82995
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-829952023-10-30T07:10:27Z Scaling of flat band potential and dielectric constant as a function of Ta concentration in Ta-TiO2 epitaxial films Zhao, Y.L. Barman, A.R. Dhar, S. Annadi, A. Motapothula, M. Wang, J. Su, H. Breese, M. Venkatesan, T. Wang, Q. PHYSICS ELECTRICAL & COMPUTER ENGINEERING MATERIALS SCIENCE AND ENGINEERING 10.1063/1.3609927 AIP Advances 1 2 - 2014-10-07T04:35:59Z 2014-10-07T04:35:59Z 2011 Article Zhao, Y.L., Barman, A.R., Dhar, S., Annadi, A., Motapothula, M., Wang, J., Su, H., Breese, M., Venkatesan, T., Wang, Q. (2011). Scaling of flat band potential and dielectric constant as a function of Ta concentration in Ta-TiO2 epitaxial films. AIP Advances 1 (2) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.3609927 21583226 http://scholarbank.nus.edu.sg/handle/10635/82995 000302137000049 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1063/1.3609927
author2 PHYSICS
author_facet PHYSICS
Zhao, Y.L.
Barman, A.R.
Dhar, S.
Annadi, A.
Motapothula, M.
Wang, J.
Su, H.
Breese, M.
Venkatesan, T.
Wang, Q.
format Article
author Zhao, Y.L.
Barman, A.R.
Dhar, S.
Annadi, A.
Motapothula, M.
Wang, J.
Su, H.
Breese, M.
Venkatesan, T.
Wang, Q.
spellingShingle Zhao, Y.L.
Barman, A.R.
Dhar, S.
Annadi, A.
Motapothula, M.
Wang, J.
Su, H.
Breese, M.
Venkatesan, T.
Wang, Q.
Scaling of flat band potential and dielectric constant as a function of Ta concentration in Ta-TiO2 epitaxial films
author_sort Zhao, Y.L.
title Scaling of flat band potential and dielectric constant as a function of Ta concentration in Ta-TiO2 epitaxial films
title_short Scaling of flat band potential and dielectric constant as a function of Ta concentration in Ta-TiO2 epitaxial films
title_full Scaling of flat band potential and dielectric constant as a function of Ta concentration in Ta-TiO2 epitaxial films
title_fullStr Scaling of flat band potential and dielectric constant as a function of Ta concentration in Ta-TiO2 epitaxial films
title_full_unstemmed Scaling of flat band potential and dielectric constant as a function of Ta concentration in Ta-TiO2 epitaxial films
title_sort scaling of flat band potential and dielectric constant as a function of ta concentration in ta-tio2 epitaxial films
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/82995
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