Scaling of flat band potential and dielectric constant as a function of Ta concentration in Ta-TiO2 epitaxial films
10.1063/1.3609927
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Main Authors: | Zhao, Y.L., Barman, A.R., Dhar, S., Annadi, A., Motapothula, M., Wang, J., Su, H., Breese, M., Venkatesan, T., Wang, Q. |
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Other Authors: | PHYSICS |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/82995 |
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Institution: | National University of Singapore |
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