Scaling of flat band potential and dielectric constant as a function of Ta concentration in Ta-TiO2 epitaxial films

• Main Authors: Zhao, Y.L., Barman, A.R., Dhar, S., Annadi, A., Motapothula, M., Wang, J., Su, H., Breese, M., Venkatesan, T., Wang, Q.
• Other Authors: PHYSICS
• Format: Article
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/82995
• Institution: National University of Singapore

10.1063/1.3609927