Scaling of flat band potential and dielectric constant as a function of Ta concentration in Ta-TiO2 epitaxial films

Scaling of flat band potential and dielectric constant as a function of Ta concentration in Ta-TiO2 epitaxial films

10.1063/1.3609927

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Bibliographic Details
Main Authors: Zhao, Y.L., Barman, A.R., Dhar, S., Annadi, A., Motapothula, M., Wang, J., Su, H., Breese, M., Venkatesan, T., Wang, Q.
Other Authors: PHYSICS
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82995
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/82995

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