Stability and composition of Ni-germanosilicided Si 1-xGe x films

Stability and composition of Ni-germanosilicided Si 1-xGe x films

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

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Bibliographic Details
Main Authors: Pey, K.L., Chattopadhyay, S., Choi, W.K., Miron, Y., Fitzgerald, E.A., Antoniadis, D.A., Osipowicz, T.
Other Authors: PHYSICS
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/83062
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/83062

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