Stability and composition of Ni-germanosilicided Si 1-xGe x films
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
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sg-nus-scholar.10635-830622015-01-13T23:45:09Z Stability and composition of Ni-germanosilicided Si 1-xGe x films Pey, K.L. Chattopadhyay, S. Choi, W.K. Miron, Y. Fitzgerald, E.A. Antoniadis, D.A. Osipowicz, T. PHYSICS ELECTRICAL & COMPUTER ENGINEERING Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 22 2 852-858 JVTBD 2014-10-07T04:36:49Z 2014-10-07T04:36:49Z 2004-03 Article Pey, K.L.,Chattopadhyay, S.,Choi, W.K.,Miron, Y.,Fitzgerald, E.A.,Antoniadis, D.A.,Osipowicz, T. (2004-03). Stability and composition of Ni-germanosilicided Si 1-xGe x films. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 22 (2) : 852-858. ScholarBank@NUS Repository. 10711023 http://scholarbank.nus.edu.sg/handle/10635/83062 NOT_IN_WOS Scopus |
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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
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PHYSICS Pey, K.L. Chattopadhyay, S. Choi, W.K. Miron, Y. Fitzgerald, E.A. Antoniadis, D.A. Osipowicz, T. |
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Pey, K.L. Chattopadhyay, S. Choi, W.K. Miron, Y. Fitzgerald, E.A. Antoniadis, D.A. Osipowicz, T. |
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Pey, K.L. Chattopadhyay, S. Choi, W.K. Miron, Y. Fitzgerald, E.A. Antoniadis, D.A. Osipowicz, T. Stability and composition of Ni-germanosilicided Si 1-xGe x films |
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Pey, K.L. |
title |
Stability and composition of Ni-germanosilicided Si 1-xGe x films |
title_short |
Stability and composition of Ni-germanosilicided Si 1-xGe x films |
title_full |
Stability and composition of Ni-germanosilicided Si 1-xGe x films |
title_fullStr |
Stability and composition of Ni-germanosilicided Si 1-xGe x films |
title_full_unstemmed |
Stability and composition of Ni-germanosilicided Si 1-xGe x films |
title_sort |
stability and composition of ni-germanosilicided si 1-xge x films |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/83062 |
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