Study on thermal stability of plasma-PH3 passivated HfAlO/In0.53Ga0.47 as gate stack for advanced metal-oxide-semiconductor field effect transistor
10.1149/1.3465300
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sg-nus-scholar.10635-831052023-10-27T07:22:47Z Study on thermal stability of plasma-PH3 passivated HfAlO/In0.53Ga0.47 as gate stack for advanced metal-oxide-semiconductor field effect transistor Suleiman, S.A. Oh, H.J. Du, A. Ng, C.M. Lee, S.J. ELECTRICAL & COMPUTER ENGINEERING 10.1149/1.3465300 Electrochemical and Solid-State Letters 13 10 H336-H338 ESLEF 2014-10-07T04:37:20Z 2014-10-07T04:37:20Z 2010 Article Suleiman, S.A., Oh, H.J., Du, A., Ng, C.M., Lee, S.J. (2010). Study on thermal stability of plasma-PH3 passivated HfAlO/In0.53Ga0.47 as gate stack for advanced metal-oxide-semiconductor field effect transistor. Electrochemical and Solid-State Letters 13 (10) : H336-H338. ScholarBank@NUS Repository. https://doi.org/10.1149/1.3465300 10990062 http://scholarbank.nus.edu.sg/handle/10635/83105 000280769700009 Scopus |
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10.1149/1.3465300 |
| author2 |
ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Suleiman, S.A. Oh, H.J. Du, A. Ng, C.M. Lee, S.J. |
| format |
Article |
| author |
Suleiman, S.A. Oh, H.J. Du, A. Ng, C.M. Lee, S.J. |
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Suleiman, S.A. Oh, H.J. Du, A. Ng, C.M. Lee, S.J. Study on thermal stability of plasma-PH3 passivated HfAlO/In0.53Ga0.47 as gate stack for advanced metal-oxide-semiconductor field effect transistor |
| author_sort |
Suleiman, S.A. |
| title |
Study on thermal stability of plasma-PH3 passivated HfAlO/In0.53Ga0.47 as gate stack for advanced metal-oxide-semiconductor field effect transistor |
| title_short |
Study on thermal stability of plasma-PH3 passivated HfAlO/In0.53Ga0.47 as gate stack for advanced metal-oxide-semiconductor field effect transistor |
| title_full |
Study on thermal stability of plasma-PH3 passivated HfAlO/In0.53Ga0.47 as gate stack for advanced metal-oxide-semiconductor field effect transistor |
| title_fullStr |
Study on thermal stability of plasma-PH3 passivated HfAlO/In0.53Ga0.47 as gate stack for advanced metal-oxide-semiconductor field effect transistor |
| title_full_unstemmed |
Study on thermal stability of plasma-PH3 passivated HfAlO/In0.53Ga0.47 as gate stack for advanced metal-oxide-semiconductor field effect transistor |
| title_sort |
study on thermal stability of plasma-ph3 passivated hfalo/in0.53ga0.47 as gate stack for advanced metal-oxide-semiconductor field effect transistor |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/83105 |
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1781784303042035712 |