Ultra high-stress liner comprising diamond-like carbon for performance enhancement of p-channel multiple-gate transistors

10.1109/TED.2009.2019388

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Bibliographic Details
Main Authors:	Tan, K.-M., Yang, M., Liow, T.-Y., Lee, R.T.P., Yeo, Y.-C.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Subjects:	Contact etch stop layer (CESL) Diamond-like carbon (DLC) FinFET Multiple-gate Strain
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/83239
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-83239
record_format	dspace
spelling	sg-nus-scholar.10635-832392023-10-30T07:12:21Z Ultra high-stress liner comprising diamond-like carbon for performance enhancement of p-channel multiple-gate transistors Tan, K.-M. Yang, M. Liow, T.-Y. Lee, R.T.P. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING Contact etch stop layer (CESL) Diamond-like carbon (DLC) FinFET Multiple-gate Strain 10.1109/TED.2009.2019388 IEEE Transactions on Electron Devices 56 6 1277-1283 IETDA 2014-10-07T04:38:56Z 2014-10-07T04:38:56Z 2009 Article Tan, K.-M., Yang, M., Liow, T.-Y., Lee, R.T.P., Yeo, Y.-C. (2009). Ultra high-stress liner comprising diamond-like carbon for performance enhancement of p-channel multiple-gate transistors. IEEE Transactions on Electron Devices 56 (6) : 1277-1283. ScholarBank@NUS Repository. https://doi.org/10.1109/TED.2009.2019388 00189383 http://scholarbank.nus.edu.sg/handle/10635/83239 000266330200015 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Contact etch stop layer (CESL) Diamond-like carbon (DLC) FinFET Multiple-gate Strain
spellingShingle	Contact etch stop layer (CESL) Diamond-like carbon (DLC) FinFET Multiple-gate Strain Tan, K.-M. Yang, M. Liow, T.-Y. Lee, R.T.P. Yeo, Y.-C. Ultra high-stress liner comprising diamond-like carbon for performance enhancement of p-channel multiple-gate transistors
description	10.1109/TED.2009.2019388
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Tan, K.-M. Yang, M. Liow, T.-Y. Lee, R.T.P. Yeo, Y.-C.
format	Article
author	Tan, K.-M. Yang, M. Liow, T.-Y. Lee, R.T.P. Yeo, Y.-C.
author_sort	Tan, K.-M.
title	Ultra high-stress liner comprising diamond-like carbon for performance enhancement of p-channel multiple-gate transistors
title_short	Ultra high-stress liner comprising diamond-like carbon for performance enhancement of p-channel multiple-gate transistors
title_full	Ultra high-stress liner comprising diamond-like carbon for performance enhancement of p-channel multiple-gate transistors
title_fullStr	Ultra high-stress liner comprising diamond-like carbon for performance enhancement of p-channel multiple-gate transistors
title_full_unstemmed	Ultra high-stress liner comprising diamond-like carbon for performance enhancement of p-channel multiple-gate transistors
title_sort	ultra high-stress liner comprising diamond-like carbon for performance enhancement of p-channel multiple-gate transistors
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/83239
_version_	1781784339744292864

Ultra high-stress liner comprising diamond-like carbon for performance enhancement of p-channel multiple-gate transistors

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