Ultra high-stress liner comprising diamond-like carbon for performance enhancement of p-channel multiple-gate transistors
10.1109/TED.2009.2019388
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Main Authors: | Tan, K.-M., Yang, M., Liow, T.-Y., Lee, R.T.P., Yeo, Y.-C. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Article |
Published: |
2014
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Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/83239 |
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Institution: | National University of Singapore |
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