A comparison study of high-density MIM capacitors with ALD HfO 2-Al 2O 3 laminated, sandwiched and stacked dielectrics
International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT
Saved in:
Main Authors: | , , , , , , , |
---|---|
Other Authors: | |
Format: | Conference or Workshop Item |
Published: |
2014
|
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/83342 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
id |
sg-nus-scholar.10635-83342 |
---|---|
record_format |
dspace |
spelling |
sg-nus-scholar.10635-833422015-01-09T14:06:29Z A comparison study of high-density MIM capacitors with ALD HfO 2-Al 2O 3 laminated, sandwiched and stacked dielectrics Ding, S.-J. Hu, H. Zhu, C. Kim, S.J. Li, M.F. Cho, B.J. Chin, A. Kwong, D.-L. ELECTRICAL & COMPUTER ENGINEERING International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT 1 403-406 2014-10-07T04:40:09Z 2014-10-07T04:40:09Z 2004 Conference Paper Ding, S.-J.,Hu, H.,Zhu, C.,Kim, S.J.,Li, M.F.,Cho, B.J.,Chin, A.,Kwong, D.-L. (2004). A comparison study of high-density MIM capacitors with ALD HfO 2-Al 2O 3 laminated, sandwiched and stacked dielectrics. International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT 1 : 403-406. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/83342 NOT_IN_WOS Scopus |
institution |
National University of Singapore |
building |
NUS Library |
country |
Singapore |
collection |
ScholarBank@NUS |
description |
International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT |
author2 |
ELECTRICAL & COMPUTER ENGINEERING |
author_facet |
ELECTRICAL & COMPUTER ENGINEERING Ding, S.-J. Hu, H. Zhu, C. Kim, S.J. Li, M.F. Cho, B.J. Chin, A. Kwong, D.-L. |
format |
Conference or Workshop Item |
author |
Ding, S.-J. Hu, H. Zhu, C. Kim, S.J. Li, M.F. Cho, B.J. Chin, A. Kwong, D.-L. |
spellingShingle |
Ding, S.-J. Hu, H. Zhu, C. Kim, S.J. Li, M.F. Cho, B.J. Chin, A. Kwong, D.-L. A comparison study of high-density MIM capacitors with ALD HfO 2-Al 2O 3 laminated, sandwiched and stacked dielectrics |
author_sort |
Ding, S.-J. |
title |
A comparison study of high-density MIM capacitors with ALD HfO 2-Al 2O 3 laminated, sandwiched and stacked dielectrics |
title_short |
A comparison study of high-density MIM capacitors with ALD HfO 2-Al 2O 3 laminated, sandwiched and stacked dielectrics |
title_full |
A comparison study of high-density MIM capacitors with ALD HfO 2-Al 2O 3 laminated, sandwiched and stacked dielectrics |
title_fullStr |
A comparison study of high-density MIM capacitors with ALD HfO 2-Al 2O 3 laminated, sandwiched and stacked dielectrics |
title_full_unstemmed |
A comparison study of high-density MIM capacitors with ALD HfO 2-Al 2O 3 laminated, sandwiched and stacked dielectrics |
title_sort |
comparison study of high-density mim capacitors with ald hfo 2-al 2o 3 laminated, sandwiched and stacked dielectrics |
publishDate |
2014 |
url |
http://scholarbank.nus.edu.sg/handle/10635/83342 |
_version_ |
1681089418253828096 |