A comparison study of high-density MIM capacitors with ALD HfO 2-Al 2O 3 laminated, sandwiched and stacked dielectrics

• Main Authors: Ding, S.-J., Hu, H., Zhu, C., Kim, S.J., Li, M.F., Cho, B.J., Chin, A., Kwong, D.-L.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/83342
• Institution: National University of Singapore

International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT