A novel hafnium carbide (HfCx) metal gate electrode for NMOS device application

10.1109/VLSIT.2007.4339764

Saved in:

Bibliographic Details
Main Authors:	Wan, S.H., Chen, S., Xing, P.W., Chan, D.S.H., Byung, J.C.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/83399
Tags:	Add Tag No Tags, Be the first to tag this record!
Institution:	National University of Singapore

id	sg-nus-scholar.10635-83399
record_format	dspace
spelling	sg-nus-scholar.10635-833992023-10-29T20:59:18Z A novel hafnium carbide (HfCx) metal gate electrode for NMOS device application Wan, S.H. Chen, S. Xing, P.W. Chan, D.S.H. Byung, J.C. ELECTRICAL & COMPUTER ENGINEERING 10.1109/VLSIT.2007.4339764 Digest of Technical Papers - Symposium on VLSI Technology 156-157 DTPTE 2014-10-07T04:40:47Z 2014-10-07T04:40:47Z 2007 Conference Paper Wan, S.H., Chen, S., Xing, P.W., Chan, D.S.H., Byung, J.C. (2007). A novel hafnium carbide (HfCx) metal gate electrode for NMOS device application. Digest of Technical Papers - Symposium on VLSI Technology : 156-157. ScholarBank@NUS Repository. https://doi.org/10.1109/VLSIT.2007.4339764 07431562 http://scholarbank.nus.edu.sg/handle/10635/83399 000250539900060 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1109/VLSIT.2007.4339764
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Wan, S.H. Chen, S. Xing, P.W. Chan, D.S.H. Byung, J.C.
format	Conference or Workshop Item
author	Wan, S.H. Chen, S. Xing, P.W. Chan, D.S.H. Byung, J.C.
spellingShingle	Wan, S.H. Chen, S. Xing, P.W. Chan, D.S.H. Byung, J.C. A novel hafnium carbide (HfCx) metal gate electrode for NMOS device application
author_sort	Wan, S.H.
title	A novel hafnium carbide (HfCx) metal gate electrode for NMOS device application
title_short	A novel hafnium carbide (HfCx) metal gate electrode for NMOS device application
title_full	A novel hafnium carbide (HfCx) metal gate electrode for NMOS device application
title_fullStr	A novel hafnium carbide (HfCx) metal gate electrode for NMOS device application
title_full_unstemmed	A novel hafnium carbide (HfCx) metal gate electrode for NMOS device application
title_sort	novel hafnium carbide (hfcx) metal gate electrode for nmos device application
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/83399
_version_	1781784355772825600

A novel hafnium carbide (HfCx) metal gate electrode for NMOS device application

Similar Items