AlGaN/GaN metal-oxide-semiconductor high-electron-mobility transistors with a high breakdown voltage of 1400 v and a complementary metal-oxide- semiconductor compatible gold-free process
10.7567/JJAP.52.04CF06
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Main Authors: | , , , , , , , , |
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Other Authors: | |
Format: | Conference or Workshop Item |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/83449 |
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Institution: | National University of Singapore |