Co-InGaAs as a novel self-aligned metallic source/drain material for implant-less In 0.53Ga 0.47As n-MOSFETs

10.1109/ISDRS.2011.6135218

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Main Authors: Ivana, Subramanian, S., Kong, E.Y.-J., Zhou, Q., Yeo, Y.-C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/83556
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spelling sg-nus-scholar.10635-835562024-11-10T04:42:38Z Co-InGaAs as a novel self-aligned metallic source/drain material for implant-less In 0.53Ga 0.47As n-MOSFETs Ivana Subramanian, S. Kong, E.Y.-J. Zhou, Q. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING 10.1109/ISDRS.2011.6135218 2011 International Semiconductor Device Research Symposium, ISDRS 2011 - 2014-10-07T04:42:33Z 2014-10-07T04:42:33Z 2011 Conference Paper Ivana,Subramanian, S.,Kong, E.Y.-J.,Zhou, Q.,Yeo, Y.-C. (2011). Co-InGaAs as a novel self-aligned metallic source/drain material for implant-less In 0.53Ga 0.47As n-MOSFETs. 2011 International Semiconductor Device Research Symposium, ISDRS 2011 : -. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/ISDRS.2011.6135218" target="_blank">https://doi.org/10.1109/ISDRS.2011.6135218</a> 9781457717550 http://scholarbank.nus.edu.sg/handle/10635/83556 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1109/ISDRS.2011.6135218
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Ivana
Subramanian, S.
Kong, E.Y.-J.
Zhou, Q.
Yeo, Y.-C.
format Conference or Workshop Item
author Ivana
Subramanian, S.
Kong, E.Y.-J.
Zhou, Q.
Yeo, Y.-C.
spellingShingle Ivana
Subramanian, S.
Kong, E.Y.-J.
Zhou, Q.
Yeo, Y.-C.
Co-InGaAs as a novel self-aligned metallic source/drain material for implant-less In 0.53Ga 0.47As n-MOSFETs
author_sort Ivana
title Co-InGaAs as a novel self-aligned metallic source/drain material for implant-less In 0.53Ga 0.47As n-MOSFETs
title_short Co-InGaAs as a novel self-aligned metallic source/drain material for implant-less In 0.53Ga 0.47As n-MOSFETs
title_full Co-InGaAs as a novel self-aligned metallic source/drain material for implant-less In 0.53Ga 0.47As n-MOSFETs
title_fullStr Co-InGaAs as a novel self-aligned metallic source/drain material for implant-less In 0.53Ga 0.47As n-MOSFETs
title_full_unstemmed Co-InGaAs as a novel self-aligned metallic source/drain material for implant-less In 0.53Ga 0.47As n-MOSFETs
title_sort co-ingaas as a novel self-aligned metallic source/drain material for implant-less in 0.53ga 0.47as n-mosfets
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/83556
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