Co-InGaAs as a novel self-aligned metallic source/drain material for implant-less In 0.53Ga 0.47As n-MOSFETs
10.1109/ISDRS.2011.6135218
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2014
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sg-nus-scholar.10635-835562024-11-10T04:42:38Z Co-InGaAs as a novel self-aligned metallic source/drain material for implant-less In 0.53Ga 0.47As n-MOSFETs Ivana Subramanian, S. Kong, E.Y.-J. Zhou, Q. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING 10.1109/ISDRS.2011.6135218 2011 International Semiconductor Device Research Symposium, ISDRS 2011 - 2014-10-07T04:42:33Z 2014-10-07T04:42:33Z 2011 Conference Paper Ivana,Subramanian, S.,Kong, E.Y.-J.,Zhou, Q.,Yeo, Y.-C. (2011). Co-InGaAs as a novel self-aligned metallic source/drain material for implant-less In 0.53Ga 0.47As n-MOSFETs. 2011 International Semiconductor Device Research Symposium, ISDRS 2011 : -. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/ISDRS.2011.6135218" target="_blank">https://doi.org/10.1109/ISDRS.2011.6135218</a> 9781457717550 http://scholarbank.nus.edu.sg/handle/10635/83556 NOT_IN_WOS Scopus |
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10.1109/ISDRS.2011.6135218 |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Ivana Subramanian, S. Kong, E.Y.-J. Zhou, Q. Yeo, Y.-C. |
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Conference or Workshop Item |
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Ivana Subramanian, S. Kong, E.Y.-J. Zhou, Q. Yeo, Y.-C. |
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Ivana Subramanian, S. Kong, E.Y.-J. Zhou, Q. Yeo, Y.-C. Co-InGaAs as a novel self-aligned metallic source/drain material for implant-less In 0.53Ga 0.47As n-MOSFETs |
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Ivana |
title |
Co-InGaAs as a novel self-aligned metallic source/drain material for implant-less In 0.53Ga 0.47As n-MOSFETs |
title_short |
Co-InGaAs as a novel self-aligned metallic source/drain material for implant-less In 0.53Ga 0.47As n-MOSFETs |
title_full |
Co-InGaAs as a novel self-aligned metallic source/drain material for implant-less In 0.53Ga 0.47As n-MOSFETs |
title_fullStr |
Co-InGaAs as a novel self-aligned metallic source/drain material for implant-less In 0.53Ga 0.47As n-MOSFETs |
title_full_unstemmed |
Co-InGaAs as a novel self-aligned metallic source/drain material for implant-less In 0.53Ga 0.47As n-MOSFETs |
title_sort |
co-ingaas as a novel self-aligned metallic source/drain material for implant-less in 0.53ga 0.47as n-mosfets |
publishDate |
2014 |
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http://scholarbank.nus.edu.sg/handle/10635/83556 |
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