Effects of O2 and Ar reactive ion etching on the field emission properties of aligned CuO nanowire films

Diffusion and Defect Data Pt.B: Solid State Phenomena

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Main Authors: Zhu, Y.W., Teo, C.H., Xu, X.J., Yu, T., Lim, C.T., Ong, C.K., Thong, J.T.L., Sow, C.H.
Other Authors: NUS NANOSCIENCE & NANOTECH INITIATIVE
Format: Conference or Workshop Item
Published: 2014
Subjects:
CuO
Online Access:http://scholarbank.nus.edu.sg/handle/10635/83682
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spelling sg-nus-scholar.10635-836822015-01-07T12:31:01Z Effects of O2 and Ar reactive ion etching on the field emission properties of aligned CuO nanowire films Zhu, Y.W. Teo, C.H. Xu, X.J. Yu, T. Lim, C.T. Ong, C.K. Thong, J.T.L. Sow, C.H. NUS NANOSCIENCE & NANOTECH INITIATIVE PHYSICS MECHANICAL ENGINEERING ELECTRICAL & COMPUTER ENGINEERING CuO Field emission Nanowires Reactive ion etching (RIE) Diffusion and Defect Data Pt.B: Solid State Phenomena 121-123 PART 2 793-796 DDBPE 2014-10-07T04:43:58Z 2014-10-07T04:43:58Z 2007 Conference Paper Zhu, Y.W.,Teo, C.H.,Xu, X.J.,Yu, T.,Lim, C.T.,Ong, C.K.,Thong, J.T.L.,Sow, C.H. (2007). Effects of O2 and Ar reactive ion etching on the field emission properties of aligned CuO nanowire films. Diffusion and Defect Data Pt.B: Solid State Phenomena 121-123 (PART 2) : 793-796. ScholarBank@NUS Repository. 3908451302 10120394 http://scholarbank.nus.edu.sg/handle/10635/83682 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
topic CuO
Field emission
Nanowires
Reactive ion etching (RIE)
spellingShingle CuO
Field emission
Nanowires
Reactive ion etching (RIE)
Zhu, Y.W.
Teo, C.H.
Xu, X.J.
Yu, T.
Lim, C.T.
Ong, C.K.
Thong, J.T.L.
Sow, C.H.
Effects of O2 and Ar reactive ion etching on the field emission properties of aligned CuO nanowire films
description Diffusion and Defect Data Pt.B: Solid State Phenomena
author2 NUS NANOSCIENCE & NANOTECH INITIATIVE
author_facet NUS NANOSCIENCE & NANOTECH INITIATIVE
Zhu, Y.W.
Teo, C.H.
Xu, X.J.
Yu, T.
Lim, C.T.
Ong, C.K.
Thong, J.T.L.
Sow, C.H.
format Conference or Workshop Item
author Zhu, Y.W.
Teo, C.H.
Xu, X.J.
Yu, T.
Lim, C.T.
Ong, C.K.
Thong, J.T.L.
Sow, C.H.
author_sort Zhu, Y.W.
title Effects of O2 and Ar reactive ion etching on the field emission properties of aligned CuO nanowire films
title_short Effects of O2 and Ar reactive ion etching on the field emission properties of aligned CuO nanowire films
title_full Effects of O2 and Ar reactive ion etching on the field emission properties of aligned CuO nanowire films
title_fullStr Effects of O2 and Ar reactive ion etching on the field emission properties of aligned CuO nanowire films
title_full_unstemmed Effects of O2 and Ar reactive ion etching on the field emission properties of aligned CuO nanowire films
title_sort effects of o2 and ar reactive ion etching on the field emission properties of aligned cuo nanowire films
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/83682
_version_ 1681089480841232384