Effects of O2 and Ar reactive ion etching on the field emission properties of aligned CuO nanowire films

• Main Authors: Zhu, Y.W., Teo, C.H., Xu, X.J., Yu, T., Lim, C.T., Ong, C.K., Thong, J.T.L., Sow, C.H.
• Other Authors: NUS NANOSCIENCE & NANOTECH INITIATIVE
• Format: Conference or Workshop Item
• Published: 2014
• Subjects: CuO; Field emission; Nanowires; Reactive ion etching (RIE)
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/83682
• Institution: National University of Singapore

Diffusion and Defect Data Pt.B: Solid State Phenomena