Effects of O2 and Ar reactive ion etching on the field emission properties of aligned CuO nanowire films

• Main Authors: Zhu, Y.W., Teo, C.H., Xu, X.J., Yu, T., Lim, C.T., Ong, C.K., Thong, J.T.L., Sow, C.H.
• 其他作者: ELECTRICAL & COMPUTER ENGINEERING
• 格式: Conference or Workshop Item
• 出版: 2014
• 主題: CuO; Field emission; Nanowires; Reactive ion etching (RIE)
• 在線閱讀: http://scholarbank.nus.edu.sg/handle/10635/83682

Diffusion and Defect Data Pt.B: Solid State Phenomena