Integration of Al segregated NiSiGe/SiGe source/drain contact technology in p-FinFETs for drive current enhancement
10.1149/1.3118959
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2014
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sg-nus-scholar.10635-838512023-10-26T09:11:41Z Integration of Al segregated NiSiGe/SiGe source/drain contact technology in p-FinFETs for drive current enhancement Sinha, M. Lee, R.T.P. Devi, S.N. Lo, G.-Q. Chor, E.F. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING 10.1149/1.3118959 ECS Transactions 19 1 323-330 2014-10-07T04:45:55Z 2014-10-07T04:45:55Z 2009 Conference Paper Sinha, M., Lee, R.T.P., Devi, S.N., Lo, G.-Q., Chor, E.F., Yeo, Y.-C. (2009). Integration of Al segregated NiSiGe/SiGe source/drain contact technology in p-FinFETs for drive current enhancement. ECS Transactions 19 (1) : 323-330. ScholarBank@NUS Repository. https://doi.org/10.1149/1.3118959 9781566777094 19385862 http://scholarbank.nus.edu.sg/handle/10635/83851 000272170600034 Scopus |
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National University of Singapore |
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NUS Library |
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Asia |
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Singapore Singapore |
| content_provider |
NUS Library |
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ScholarBank@NUS |
| description |
10.1149/1.3118959 |
| author2 |
ELECTRICAL & COMPUTER ENGINEERING |
| author_facet |
ELECTRICAL & COMPUTER ENGINEERING Sinha, M. Lee, R.T.P. Devi, S.N. Lo, G.-Q. Chor, E.F. Yeo, Y.-C. |
| format |
Conference or Workshop Item |
| author |
Sinha, M. Lee, R.T.P. Devi, S.N. Lo, G.-Q. Chor, E.F. Yeo, Y.-C. |
| spellingShingle |
Sinha, M. Lee, R.T.P. Devi, S.N. Lo, G.-Q. Chor, E.F. Yeo, Y.-C. Integration of Al segregated NiSiGe/SiGe source/drain contact technology in p-FinFETs for drive current enhancement |
| author_sort |
Sinha, M. |
| title |
Integration of Al segregated NiSiGe/SiGe source/drain contact technology in p-FinFETs for drive current enhancement |
| title_short |
Integration of Al segregated NiSiGe/SiGe source/drain contact technology in p-FinFETs for drive current enhancement |
| title_full |
Integration of Al segregated NiSiGe/SiGe source/drain contact technology in p-FinFETs for drive current enhancement |
| title_fullStr |
Integration of Al segregated NiSiGe/SiGe source/drain contact technology in p-FinFETs for drive current enhancement |
| title_full_unstemmed |
Integration of Al segregated NiSiGe/SiGe source/drain contact technology in p-FinFETs for drive current enhancement |
| title_sort |
integration of al segregated nisige/sige source/drain contact technology in p-finfets for drive current enhancement |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/83851 |
| _version_ |
1781784397362495488 |