Is sub-10nm thick 3D-topological insulator good for the local electrical interconnects?
10.1109/IEDM.2013.6724738
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| Main Authors: | , , |
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| Other Authors: | |
| Format: | Conference or Workshop Item |
| Published: |
2014
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| Online Access: | http://scholarbank.nus.edu.sg/handle/10635/83870 |
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| Institution: | National University of Singapore |