Low Vt gate-first Al/TaN/[Ir3Si-HfSi 2-x]/HfLaON CMOS using simple laser annealing/reflection

10.1109/VLSIT.2008.4588614

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Bibliographic Details
Main Authors:	Liao, C.C., Chin, A., Su, N.C., Li, M.-F., Wang, S.J.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/83909
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-83909
record_format	dspace
spelling	sg-nus-scholar.10635-839092015-01-07T10:08:33Z Low Vt gate-first Al/TaN/[Ir3Si-HfSi 2-x]/HfLaON CMOS using simple laser annealing/reflection Liao, C.C. Chin, A. Su, N.C. Li, M.-F. Wang, S.J. ELECTRICAL & COMPUTER ENGINEERING 10.1109/VLSIT.2008.4588614 Digest of Technical Papers - Symposium on VLSI Technology 190-191 DTPTE 2014-10-07T04:46:36Z 2014-10-07T04:46:36Z 2008 Conference Paper Liao, C.C.,Chin, A.,Su, N.C.,Li, M.-F.,Wang, S.J. (2008). Low Vt gate-first Al/TaN/[Ir3Si-HfSi 2-x]/HfLaON CMOS using simple laser annealing/reflection. Digest of Technical Papers - Symposium on VLSI Technology : 190-191. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/VLSIT.2008.4588614" target="_blank">https://doi.org/10.1109/VLSIT.2008.4588614</a> 9781424418053 07431562 http://scholarbank.nus.edu.sg/handle/10635/83909 000259116200072 Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	10.1109/VLSIT.2008.4588614
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Liao, C.C. Chin, A. Su, N.C. Li, M.-F. Wang, S.J.
format	Conference or Workshop Item
author	Liao, C.C. Chin, A. Su, N.C. Li, M.-F. Wang, S.J.
spellingShingle	Liao, C.C. Chin, A. Su, N.C. Li, M.-F. Wang, S.J. Low Vt gate-first Al/TaN/[Ir3Si-HfSi 2-x]/HfLaON CMOS using simple laser annealing/reflection
author_sort	Liao, C.C.
title	Low Vt gate-first Al/TaN/[Ir3Si-HfSi 2-x]/HfLaON CMOS using simple laser annealing/reflection
title_short	Low Vt gate-first Al/TaN/[Ir3Si-HfSi 2-x]/HfLaON CMOS using simple laser annealing/reflection
title_full	Low Vt gate-first Al/TaN/[Ir3Si-HfSi 2-x]/HfLaON CMOS using simple laser annealing/reflection
title_fullStr	Low Vt gate-first Al/TaN/[Ir3Si-HfSi 2-x]/HfLaON CMOS using simple laser annealing/reflection
title_full_unstemmed	Low Vt gate-first Al/TaN/[Ir3Si-HfSi 2-x]/HfLaON CMOS using simple laser annealing/reflection
title_sort	low vt gate-first al/tan/[ir3si-hfsi 2-x]/hflaon cmos using simple laser annealing/reflection
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/83909
_version_	1681089522275713024

Low Vt gate-first Al/TaN/[Ir3Si-HfSi 2-x]/HfLaON CMOS using simple laser annealing/reflection

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