Oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films

Oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films

International Journal of Modern Physics B

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Bibliographic Details
Main Authors: Leoy, C.C., Kan, E.W.H., Arianto, J., Choi, W.K., Wee, A.T.S., Liu, Y.J.
Other Authors: INSTITUTE OF ENGINEERING SCIENCE
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/84065
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Institution: National University of Singapore
Description
Summary:International Journal of Modern Physics B

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