Oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films

International Journal of Modern Physics B

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Bibliographic Details
Main Authors: Leoy, C.C., Kan, E.W.H., Arianto, J., Choi, W.K., Wee, A.T.S., Liu, Y.J.
Other Authors: INSTITUTE OF ENGINEERING SCIENCE
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/84065
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-840652015-01-06T04:21:27Z Oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films Leoy, C.C. Kan, E.W.H. Arianto, J. Choi, W.K. Wee, A.T.S. Liu, Y.J. INSTITUTE OF ENGINEERING SCIENCE PHYSICS ELECTRICAL & COMPUTER ENGINEERING International Journal of Modern Physics B 16 28-29 4224-4227 IJPBE 2014-10-07T04:48:23Z 2014-10-07T04:48:23Z 2002-11-20 Conference Paper Leoy, C.C.,Kan, E.W.H.,Arianto, J.,Choi, W.K.,Wee, A.T.S.,Liu, Y.J. (2002-11-20). Oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films. International Journal of Modern Physics B 16 (28-29) : 4224-4227. ScholarBank@NUS Repository. 02179792 http://scholarbank.nus.edu.sg/handle/10635/84065 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
description International Journal of Modern Physics B
author2 INSTITUTE OF ENGINEERING SCIENCE
author_facet INSTITUTE OF ENGINEERING SCIENCE
Leoy, C.C.
Kan, E.W.H.
Arianto, J.
Choi, W.K.
Wee, A.T.S.
Liu, Y.J.
format Conference or Workshop Item
author Leoy, C.C.
Kan, E.W.H.
Arianto, J.
Choi, W.K.
Wee, A.T.S.
Liu, Y.J.
spellingShingle Leoy, C.C.
Kan, E.W.H.
Arianto, J.
Choi, W.K.
Wee, A.T.S.
Liu, Y.J.
Oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films
author_sort Leoy, C.C.
title Oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films
title_short Oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films
title_full Oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films
title_fullStr Oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films
title_full_unstemmed Oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films
title_sort oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/84065
_version_ 1681089550656471040