Oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films

International Journal of Modern Physics B

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Bibliographic Details
Main Authors:	Leoy, C.C., Kan, E.W.H., Arianto, J., Choi, W.K., Wee, A.T.S., Liu, Y.J.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/84065
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Institution:	National University of Singapore

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spelling	sg-nus-scholar.10635-840652024-11-12T21:15:41Z Oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films Leoy, C.C. Kan, E.W.H. Arianto, J. Choi, W.K. Wee, A.T.S. Liu, Y.J. ELECTRICAL & COMPUTER ENGINEERING INSTITUTE OF ENGINEERING SCIENCE PHYSICS International Journal of Modern Physics B 16 28-29 4224-4227 IJPBE 2014-10-07T04:48:23Z 2014-10-07T04:48:23Z 2002-11-20 Conference Paper Leoy, C.C.,Kan, E.W.H.,Arianto, J.,Choi, W.K.,Wee, A.T.S.,Liu, Y.J. (2002-11-20). Oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films. International Journal of Modern Physics B 16 (28-29) : 4224-4227. ScholarBank@NUS Repository. 02179792 http://scholarbank.nus.edu.sg/handle/10635/84065 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	International Journal of Modern Physics B
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Leoy, C.C. Kan, E.W.H. Arianto, J. Choi, W.K. Wee, A.T.S. Liu, Y.J.
format	Conference or Workshop Item
author	Leoy, C.C. Kan, E.W.H. Arianto, J. Choi, W.K. Wee, A.T.S. Liu, Y.J.
spellingShingle	Leoy, C.C. Kan, E.W.H. Arianto, J. Choi, W.K. Wee, A.T.S. Liu, Y.J. Oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films
author_sort	Leoy, C.C.
title	Oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films
title_short	Oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films
title_full	Oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films
title_fullStr	Oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films
title_full_unstemmed	Oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films
title_sort	oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/84065
_version_	1821189489601544192

Oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films

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