Oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films
International Journal of Modern Physics B
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2014
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sg-nus-scholar.10635-840652015-01-06T04:21:27Z Oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films Leoy, C.C. Kan, E.W.H. Arianto, J. Choi, W.K. Wee, A.T.S. Liu, Y.J. INSTITUTE OF ENGINEERING SCIENCE PHYSICS ELECTRICAL & COMPUTER ENGINEERING International Journal of Modern Physics B 16 28-29 4224-4227 IJPBE 2014-10-07T04:48:23Z 2014-10-07T04:48:23Z 2002-11-20 Conference Paper Leoy, C.C.,Kan, E.W.H.,Arianto, J.,Choi, W.K.,Wee, A.T.S.,Liu, Y.J. (2002-11-20). Oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films. International Journal of Modern Physics B 16 (28-29) : 4224-4227. ScholarBank@NUS Repository. 02179792 http://scholarbank.nus.edu.sg/handle/10635/84065 NOT_IN_WOS Scopus |
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International Journal of Modern Physics B |
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INSTITUTE OF ENGINEERING SCIENCE |
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INSTITUTE OF ENGINEERING SCIENCE Leoy, C.C. Kan, E.W.H. Arianto, J. Choi, W.K. Wee, A.T.S. Liu, Y.J. |
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Conference or Workshop Item |
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Leoy, C.C. Kan, E.W.H. Arianto, J. Choi, W.K. Wee, A.T.S. Liu, Y.J. |
spellingShingle |
Leoy, C.C. Kan, E.W.H. Arianto, J. Choi, W.K. Wee, A.T.S. Liu, Y.J. Oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films |
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Leoy, C.C. |
title |
Oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films |
title_short |
Oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films |
title_full |
Oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films |
title_fullStr |
Oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films |
title_full_unstemmed |
Oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films |
title_sort |
oxidation study of rf sputtered amorphous and polycrstalline silicon germanium films |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/84065 |
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1681089550656471040 |