Reliability analysis of thin HfO2/SiO2 gate dielectric stack

10.1109/IWPSD.2007.4472471

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Bibliographic Details
Main Authors: Samanta, P., Zhu, C., Chan, M.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
MOS
Online Access:http://scholarbank.nus.edu.sg/handle/10635/84132
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-841322024-11-10T18:36:45Z Reliability analysis of thin HfO2/SiO2 gate dielectric stack Samanta, P. Zhu, C. Chan, M. ELECTRICAL & COMPUTER ENGINEERING Charge trapping HfO2 MOS TDDB 10.1109/IWPSD.2007.4472471 Proceedings of the 14th International Workshop on the Physics of Semiconductor Devices, IWPSD 142-145 2014-10-07T04:49:10Z 2014-10-07T04:49:10Z 2007 Conference Paper Samanta, P.,Zhu, C.,Chan, M. (2007). Reliability analysis of thin HfO2/SiO2 gate dielectric stack. Proceedings of the 14th International Workshop on the Physics of Semiconductor Devices, IWPSD : 142-145. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/IWPSD.2007.4472471" target="_blank">https://doi.org/10.1109/IWPSD.2007.4472471</a> 9781424417285 http://scholarbank.nus.edu.sg/handle/10635/84132 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic Charge trapping
HfO2
MOS
TDDB
spellingShingle Charge trapping
HfO2
MOS
TDDB
Samanta, P.
Zhu, C.
Chan, M.
Reliability analysis of thin HfO2/SiO2 gate dielectric stack
description 10.1109/IWPSD.2007.4472471
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Samanta, P.
Zhu, C.
Chan, M.
format Conference or Workshop Item
author Samanta, P.
Zhu, C.
Chan, M.
author_sort Samanta, P.
title Reliability analysis of thin HfO2/SiO2 gate dielectric stack
title_short Reliability analysis of thin HfO2/SiO2 gate dielectric stack
title_full Reliability analysis of thin HfO2/SiO2 gate dielectric stack
title_fullStr Reliability analysis of thin HfO2/SiO2 gate dielectric stack
title_full_unstemmed Reliability analysis of thin HfO2/SiO2 gate dielectric stack
title_sort reliability analysis of thin hfo2/sio2 gate dielectric stack
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/84132
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