Reliability analysis of thin HfO2/SiO2 gate dielectric stack
10.1109/IWPSD.2007.4472471
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sg-nus-scholar.10635-841322024-11-10T18:36:45Z Reliability analysis of thin HfO2/SiO2 gate dielectric stack Samanta, P. Zhu, C. Chan, M. ELECTRICAL & COMPUTER ENGINEERING Charge trapping HfO2 MOS TDDB 10.1109/IWPSD.2007.4472471 Proceedings of the 14th International Workshop on the Physics of Semiconductor Devices, IWPSD 142-145 2014-10-07T04:49:10Z 2014-10-07T04:49:10Z 2007 Conference Paper Samanta, P.,Zhu, C.,Chan, M. (2007). Reliability analysis of thin HfO2/SiO2 gate dielectric stack. Proceedings of the 14th International Workshop on the Physics of Semiconductor Devices, IWPSD : 142-145. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/IWPSD.2007.4472471" target="_blank">https://doi.org/10.1109/IWPSD.2007.4472471</a> 9781424417285 http://scholarbank.nus.edu.sg/handle/10635/84132 NOT_IN_WOS Scopus |
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Charge trapping HfO2 MOS TDDB |
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Charge trapping HfO2 MOS TDDB Samanta, P. Zhu, C. Chan, M. Reliability analysis of thin HfO2/SiO2 gate dielectric stack |
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10.1109/IWPSD.2007.4472471 |
author2 |
ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Samanta, P. Zhu, C. Chan, M. |
format |
Conference or Workshop Item |
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Samanta, P. Zhu, C. Chan, M. |
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Samanta, P. |
title |
Reliability analysis of thin HfO2/SiO2 gate dielectric stack |
title_short |
Reliability analysis of thin HfO2/SiO2 gate dielectric stack |
title_full |
Reliability analysis of thin HfO2/SiO2 gate dielectric stack |
title_fullStr |
Reliability analysis of thin HfO2/SiO2 gate dielectric stack |
title_full_unstemmed |
Reliability analysis of thin HfO2/SiO2 gate dielectric stack |
title_sort |
reliability analysis of thin hfo2/sio2 gate dielectric stack |
publishDate |
2014 |
url |
http://scholarbank.nus.edu.sg/handle/10635/84132 |
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