State-of-the-art surface passivation of boron emitters using inline PECVD AlOx/SiNx stacks for industrial high-efficiency silicon wafer solar cells

State-of-the-art surface passivation of boron emitters using inline PECVD AlOx/SiNx stacks for industrial high-efficiency silicon wafer solar cells

10.1109/PVSC.2012.6317780

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Bibliographic Details
Main Authors: Duttagupta, S., Lin, F., Shetty, K.D., Wilson, M., Ma, F.-J., Lin, J., Aberle, A.G., Hoex, B.
Other Authors: SOLAR ENERGY RESEARCH INST OF S'PORE
Format: Conference or Workshop Item
Published: 2014
Subjects:
boron emitter
firing activation
industrial PECVD AlOx/SiN x stacks
surface passivation
Online Access:http://scholarbank.nus.edu.sg/handle/10635/84221
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/84221

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