A new fabrication method for low stress PECVD - SiNx layers

10.1088/1742-6596/34/1/126

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Main Authors: Ong, P.L., Wei, J., Tay, F.E.H., Iliescu, C.
Other Authors: MECHANICAL ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/84796
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-847962023-10-25T23:34:03Z A new fabrication method for low stress PECVD - SiNx layers Ong, P.L. Wei, J. Tay, F.E.H. Iliescu, C. MECHANICAL ENGINEERING 10.1088/1742-6596/34/1/126 Journal of Physics: Conference Series 34 1 764-769 2014-10-07T09:00:24Z 2014-10-07T09:00:24Z 2006-04-01 Article Ong, P.L., Wei, J., Tay, F.E.H., Iliescu, C. (2006-04-01). A new fabrication method for low stress PECVD - SiNx layers. Journal of Physics: Conference Series 34 (1) : 764-769. ScholarBank@NUS Repository. https://doi.org/10.1088/1742-6596/34/1/126 17426588 http://scholarbank.nus.edu.sg/handle/10635/84796 000286667100126 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1088/1742-6596/34/1/126
author2 MECHANICAL ENGINEERING
author_facet MECHANICAL ENGINEERING
Ong, P.L.
Wei, J.
Tay, F.E.H.
Iliescu, C.
format Article
author Ong, P.L.
Wei, J.
Tay, F.E.H.
Iliescu, C.
spellingShingle Ong, P.L.
Wei, J.
Tay, F.E.H.
Iliescu, C.
A new fabrication method for low stress PECVD - SiNx layers
author_sort Ong, P.L.
title A new fabrication method for low stress PECVD - SiNx layers
title_short A new fabrication method for low stress PECVD - SiNx layers
title_full A new fabrication method for low stress PECVD - SiNx layers
title_fullStr A new fabrication method for low stress PECVD - SiNx layers
title_full_unstemmed A new fabrication method for low stress PECVD - SiNx layers
title_sort new fabrication method for low stress pecvd - sinx layers
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/84796
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