A new fabrication method for low stress PECVD - SiNx layers

10.1088/1742-6596/34/1/126

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Main Authors:	Ong, P.L., Wei, J., Tay, F.E.H., Iliescu, C.
Other Authors:	MECHANICAL ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/84796
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Institution:	National University of Singapore

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spelling	sg-nus-scholar.10635-847962023-10-25T23:34:03Z A new fabrication method for low stress PECVD - SiNx layers Ong, P.L. Wei, J. Tay, F.E.H. Iliescu, C. MECHANICAL ENGINEERING 10.1088/1742-6596/34/1/126 Journal of Physics: Conference Series 34 1 764-769 2014-10-07T09:00:24Z 2014-10-07T09:00:24Z 2006-04-01 Article Ong, P.L., Wei, J., Tay, F.E.H., Iliescu, C. (2006-04-01). A new fabrication method for low stress PECVD - SiNx layers. Journal of Physics: Conference Series 34 (1) : 764-769. ScholarBank@NUS Repository. https://doi.org/10.1088/1742-6596/34/1/126 17426588 http://scholarbank.nus.edu.sg/handle/10635/84796 000286667100126 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1088/1742-6596/34/1/126
author2	MECHANICAL ENGINEERING
author_facet	MECHANICAL ENGINEERING Ong, P.L. Wei, J. Tay, F.E.H. Iliescu, C.
format	Article
author	Ong, P.L. Wei, J. Tay, F.E.H. Iliescu, C.
spellingShingle	Ong, P.L. Wei, J. Tay, F.E.H. Iliescu, C. A new fabrication method for low stress PECVD - SiNx layers
author_sort	Ong, P.L.
title	A new fabrication method for low stress PECVD - SiNx layers
title_short	A new fabrication method for low stress PECVD - SiNx layers
title_full	A new fabrication method for low stress PECVD - SiNx layers
title_fullStr	A new fabrication method for low stress PECVD - SiNx layers
title_full_unstemmed	A new fabrication method for low stress PECVD - SiNx layers
title_sort	new fabrication method for low stress pecvd - sinx layers
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/84796
_version_	1781784509031645184

A new fabrication method for low stress PECVD - SiNx layers

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