Effect of halogen in high-density oxygen plasmas on photoresist trimming

10.1002/aic.10145

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Bibliographic Details
Main Authors:	Sin, C.-Y., Chen, B.-H., Loh, W.L., Yu, J., Yelehanka, P., See, A., Chan, L.
Other Authors:	CHEMICAL & ENVIRONMENTAL ENGINEERING
Format:	Article
Published:	2014
Subjects:	Activation energy Halogen ICP etcher Oxygen plasma Photoresist trimming Resist profiles Trim rate
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/91937
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Institution:	National University of Singapore

Description
Summary:	10.1002/aic.10145

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