Effect of halogen in high-density oxygen plasmas on photoresist trimming
10.1002/aic.10145
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Main Authors: | Sin, C.-Y., Chen, B.-H., Loh, W.L., Yu, J., Yelehanka, P., See, A., Chan, L. |
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Other Authors: | CHEMICAL & ENVIRONMENTAL ENGINEERING |
Format: | Article |
Published: |
2014
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Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/91937 |
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Institution: | National University of Singapore |
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