Effect of halogen in high-density oxygen plasmas on photoresist trimming

10.1002/aic.10145

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Bibliographic Details
Main Authors:	Sin, C.-Y., Chen, B.-H., Loh, W.L., Yu, J., Yelehanka, P., See, A., Chan, L.
Other Authors:	CHEMICAL & ENVIRONMENTAL ENGINEERING
Format:	Article
Published:	2014
Subjects:	Activation energy Halogen ICP etcher Oxygen plasma Photoresist trimming Resist profiles Trim rate
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/91937
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-91937
record_format	dspace
spelling	sg-nus-scholar.10635-919372023-10-27T09:35:46Z Effect of halogen in high-density oxygen plasmas on photoresist trimming Sin, C.-Y. Chen, B.-H. Loh, W.L. Yu, J. Yelehanka, P. See, A. Chan, L. CHEMICAL & ENVIRONMENTAL ENGINEERING Activation energy Halogen ICP etcher Oxygen plasma Photoresist trimming Resist profiles Trim rate 10.1002/aic.10145 AIChE Journal 50 7 1578-1588 AICEA 2014-10-09T09:52:46Z 2014-10-09T09:52:46Z 2004-07 Article Sin, C.-Y., Chen, B.-H., Loh, W.L., Yu, J., Yelehanka, P., See, A., Chan, L. (2004-07). Effect of halogen in high-density oxygen plasmas on photoresist trimming. AIChE Journal 50 (7) : 1578-1588. ScholarBank@NUS Repository. https://doi.org/10.1002/aic.10145 00011541 http://scholarbank.nus.edu.sg/handle/10635/91937 000222362500022 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Activation energy Halogen ICP etcher Oxygen plasma Photoresist trimming Resist profiles Trim rate
spellingShingle	Activation energy Halogen ICP etcher Oxygen plasma Photoresist trimming Resist profiles Trim rate Sin, C.-Y. Chen, B.-H. Loh, W.L. Yu, J. Yelehanka, P. See, A. Chan, L. Effect of halogen in high-density oxygen plasmas on photoresist trimming
description	10.1002/aic.10145
author2	CHEMICAL & ENVIRONMENTAL ENGINEERING
author_facet	CHEMICAL & ENVIRONMENTAL ENGINEERING Sin, C.-Y. Chen, B.-H. Loh, W.L. Yu, J. Yelehanka, P. See, A. Chan, L.
format	Article
author	Sin, C.-Y. Chen, B.-H. Loh, W.L. Yu, J. Yelehanka, P. See, A. Chan, L.
author_sort	Sin, C.-Y.
title	Effect of halogen in high-density oxygen plasmas on photoresist trimming
title_short	Effect of halogen in high-density oxygen plasmas on photoresist trimming
title_full	Effect of halogen in high-density oxygen plasmas on photoresist trimming
title_fullStr	Effect of halogen in high-density oxygen plasmas on photoresist trimming
title_full_unstemmed	Effect of halogen in high-density oxygen plasmas on photoresist trimming
title_sort	effect of halogen in high-density oxygen plasmas on photoresist trimming
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/91937
_version_	1781785715866075136

Effect of halogen in high-density oxygen plasmas on photoresist trimming

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