Characterization of Si(100) surface after high density HBr/Cl2/O2 plasma etching
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
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2014
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sg-nus-scholar.10635-932682024-11-09T04:03:49Z Characterization of Si(100) surface after high density HBr/Cl2/O2 plasma etching Low, C.H. Chin, W.S. Tan, K.L. Loh, F.C. Zhou, M. Zhong, Q.H. Chan, L.H. PHYSICS CHEMISTRY Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 39 1 14-19 JAPND 2014-10-16T08:22:20Z 2014-10-16T08:22:20Z 2000-01 Article Low, C.H.,Chin, W.S.,Tan, K.L.,Loh, F.C.,Zhou, M.,Zhong, Q.H.,Chan, L.H. (2000-01). Characterization of Si(100) surface after high density HBr/Cl2/O2 plasma etching. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 39 (1) : 14-19. ScholarBank@NUS Repository. 00214922 http://scholarbank.nus.edu.sg/handle/10635/93268 NOT_IN_WOS Scopus |
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National University of Singapore |
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NUS Library |
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Asia |
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Singapore Singapore |
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NUS Library |
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ScholarBank@NUS |
| description |
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
| author2 |
PHYSICS |
| author_facet |
PHYSICS Low, C.H. Chin, W.S. Tan, K.L. Loh, F.C. Zhou, M. Zhong, Q.H. Chan, L.H. |
| format |
Article |
| author |
Low, C.H. Chin, W.S. Tan, K.L. Loh, F.C. Zhou, M. Zhong, Q.H. Chan, L.H. |
| spellingShingle |
Low, C.H. Chin, W.S. Tan, K.L. Loh, F.C. Zhou, M. Zhong, Q.H. Chan, L.H. Characterization of Si(100) surface after high density HBr/Cl2/O2 plasma etching |
| author_sort |
Low, C.H. |
| title |
Characterization of Si(100) surface after high density HBr/Cl2/O2 plasma etching |
| title_short |
Characterization of Si(100) surface after high density HBr/Cl2/O2 plasma etching |
| title_full |
Characterization of Si(100) surface after high density HBr/Cl2/O2 plasma etching |
| title_fullStr |
Characterization of Si(100) surface after high density HBr/Cl2/O2 plasma etching |
| title_full_unstemmed |
Characterization of Si(100) surface after high density HBr/Cl2/O2 plasma etching |
| title_sort |
characterization of si(100) surface after high density hbr/cl2/o2 plasma etching |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/93268 |
| _version_ |
1821201519857369088 |