Characterization of Si(100) surface after high density HBr/Cl2/O2 plasma etching

Characterization of Si(100) surface after high density HBr/Cl2/O2 plasma etching

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

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Bibliographic Details
Main Authors:	Low, C.H., Chin, W.S., Tan, K.L., Loh, F.C., Zhou, M., Zhong, Q.H., Chan, L.H.
Other Authors:	PHYSICS
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/93268
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Institution:	National University of Singapore

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