Reduction of local mechanical stress in a transistor using Si 3N4/SiOxNy, contact ESL

10.1149/1.1843754

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Main Authors:	Toh, S.L., Loh, K.P., Boothroyd, C.B., Li, K., Ang, C.H., Er, E., Chan, L.
Other Authors:	CHEMISTRY
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/94701
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-94701
record_format	dspace
spelling	sg-nus-scholar.10635-947012023-10-30T10:04:18Z Reduction of local mechanical stress in a transistor using Si 3N4/SiOxNy, contact ESL Toh, S.L. Loh, K.P. Boothroyd, C.B. Li, K. Ang, C.H. Er, E. Chan, L. CHEMISTRY 10.1149/1.1843754 Electrochemical and Solid-State Letters 8 2 G38-G40 ESLEF 2014-10-16T08:39:05Z 2014-10-16T08:39:05Z 2005 Article Toh, S.L., Loh, K.P., Boothroyd, C.B., Li, K., Ang, C.H., Er, E., Chan, L. (2005). Reduction of local mechanical stress in a transistor using Si 3N4/SiOxNy, contact ESL. Electrochemical and Solid-State Letters 8 (2) : G38-G40. ScholarBank@NUS Repository. https://doi.org/10.1149/1.1843754 10990062 http://scholarbank.nus.edu.sg/handle/10635/94701 000226293900032 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1149/1.1843754
author2	CHEMISTRY
author_facet	CHEMISTRY Toh, S.L. Loh, K.P. Boothroyd, C.B. Li, K. Ang, C.H. Er, E. Chan, L.
format	Article
author	Toh, S.L. Loh, K.P. Boothroyd, C.B. Li, K. Ang, C.H. Er, E. Chan, L.
spellingShingle	Toh, S.L. Loh, K.P. Boothroyd, C.B. Li, K. Ang, C.H. Er, E. Chan, L. Reduction of local mechanical stress in a transistor using Si 3N4/SiOxNy, contact ESL
author_sort	Toh, S.L.
title	Reduction of local mechanical stress in a transistor using Si 3N4/SiOxNy, contact ESL
title_short	Reduction of local mechanical stress in a transistor using Si 3N4/SiOxNy, contact ESL
title_full	Reduction of local mechanical stress in a transistor using Si 3N4/SiOxNy, contact ESL
title_fullStr	Reduction of local mechanical stress in a transistor using Si 3N4/SiOxNy, contact ESL
title_full_unstemmed	Reduction of local mechanical stress in a transistor using Si 3N4/SiOxNy, contact ESL
title_sort	reduction of local mechanical stress in a transistor using si 3n4/sioxny, contact esl
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/94701
_version_	1781786144938131456

Reduction of local mechanical stress in a transistor using Si 3N4/SiOxNy, contact ESL

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