Evaluation of the strain state in SiGe/Si heterostructures by high resolution X-ray diffraction and convergent beam electron diffraction

Evaluation of the strain state in SiGe/Si heterostructures by high resolution X-ray diffraction and convergent beam electron diffraction

Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA

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Bibliographic Details
Main Authors: Toh, S.L., Li, K., Ang, C.H., Rao, R., Er, E., Loh, K.P., Boothroyd, C.B., Chan, L.
Other Authors: CHEMISTRY
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/77440
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/77440

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