Evaluation of the strain state in SiGe/Si heterostructures by high resolution X-ray diffraction and convergent beam electron diffraction

• Main Authors: Toh, S.L., Li, K., Ang, C.H., Rao, R., Er, E., Loh, K.P., Boothroyd, C.B., Chan, L.
• Other Authors: CHEMISTRY
• Format: Conference or Workshop Item
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/77440
• Institution: National University of Singapore

Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA