Band alignment and thermal stability of HfO2 gate dielectric on SiC

10.1063/1.2969061

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Bibliographic Details
Main Authors:	Chen, Q., Feng, Y.P., Chai, J.W., Zhang, Z., Pan, J.S., Wang, S.J.
Other Authors:	PHYSICS
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/95846
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-95846
record_format	dspace
spelling	sg-nus-scholar.10635-958462024-11-09T10:15:39Z Band alignment and thermal stability of HfO2 gate dielectric on SiC Chen, Q. Feng, Y.P. Chai, J.W. Zhang, Z. Pan, J.S. Wang, S.J. PHYSICS 10.1063/1.2969061 Applied Physics Letters 93 5 - APPLA 2014-10-16T09:16:30Z 2014-10-16T09:16:30Z 2008 Article Chen, Q., Feng, Y.P., Chai, J.W., Zhang, Z., Pan, J.S., Wang, S.J. (2008). Band alignment and thermal stability of HfO2 gate dielectric on SiC. Applied Physics Letters 93 (5) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2969061 00036951 http://scholarbank.nus.edu.sg/handle/10635/95846 000258335900040 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1063/1.2969061
author2	PHYSICS
author_facet	PHYSICS Chen, Q. Feng, Y.P. Chai, J.W. Zhang, Z. Pan, J.S. Wang, S.J.
format	Article
author	Chen, Q. Feng, Y.P. Chai, J.W. Zhang, Z. Pan, J.S. Wang, S.J.
spellingShingle	Chen, Q. Feng, Y.P. Chai, J.W. Zhang, Z. Pan, J.S. Wang, S.J. Band alignment and thermal stability of HfO2 gate dielectric on SiC
author_sort	Chen, Q.
title	Band alignment and thermal stability of HfO2 gate dielectric on SiC
title_short	Band alignment and thermal stability of HfO2 gate dielectric on SiC
title_full	Band alignment and thermal stability of HfO2 gate dielectric on SiC
title_fullStr	Band alignment and thermal stability of HfO2 gate dielectric on SiC
title_full_unstemmed	Band alignment and thermal stability of HfO2 gate dielectric on SiC
title_sort	band alignment and thermal stability of hfo2 gate dielectric on sic
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/95846
_version_	1821222996712357888

Band alignment and thermal stability of HfO2 gate dielectric on SiC

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