Band offsets of HfO2 /ZnO interface: In situ x-ray photoelectron spectroscopy measurement and ab initio calculation

• Main Authors: Chen, Q., Yang, M., Feng, Y.P., Chai, J.W., Zhang, Z., Pan, J.S., Wang, S.J.
• Other Authors: PHYSICS
• Format: Article
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/95853
• Institution: National University of Singapore

10.1063/1.3253420