Band offsets of HfO2 /ZnO interface: In situ x-ray photoelectron spectroscopy measurement and ab initio calculation

Band offsets of HfO2 /ZnO interface: In situ x-ray photoelectron spectroscopy measurement and ab initio calculation

10.1063/1.3253420

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Bibliographic Details
Main Authors:	Chen, Q., Yang, M., Feng, Y.P., Chai, J.W., Zhang, Z., Pan, J.S., Wang, S.J.
Other Authors:	PHYSICS
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/95853
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Institution:	National University of Singapore

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