Band offsets of HfO2 /ZnO interface: In situ x-ray photoelectron spectroscopy measurement and ab initio calculation

• Main Authors: Chen, Q., Yang, M., Feng, Y.P., Chai, J.W., Zhang, Z., Pan, J.S., Wang, S.J.
• 其他作者: PHYSICS
• 格式: Article
• 出版: 2014
• 在線閱讀: http://scholarbank.nus.edu.sg/handle/10635/95853

10.1063/1.3253420