Characterization of interfacial reactions between ionized metal plasma deposited Al-0.5 wt.% Cu and Ti on SiO2
10.1016/S0921-5107(00)00481-5
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sg-nus-scholar.10635-959612023-10-26T21:14:22Z Characterization of interfacial reactions between ionized metal plasma deposited Al-0.5 wt.% Cu and Ti on SiO2 Lee, Y.K. Maung Latt, K. Li, S. Osipowicz, T. Chiam, S.Y. PHYSICS 10.1016/S0921-5107(00)00481-5 Materials Science and Engineering B: Solid-State Materials for Advanced Technology 77 1 101-105 MSBTE 2014-10-16T09:17:51Z 2014-10-16T09:17:51Z 2000-08-07 Article Lee, Y.K., Maung Latt, K., Li, S., Osipowicz, T., Chiam, S.Y. (2000-08-07). Characterization of interfacial reactions between ionized metal plasma deposited Al-0.5 wt.% Cu and Ti on SiO2. Materials Science and Engineering B: Solid-State Materials for Advanced Technology 77 (1) : 101-105. ScholarBank@NUS Repository. https://doi.org/10.1016/S0921-5107(00)00481-5 09215107 http://scholarbank.nus.edu.sg/handle/10635/95961 000088607700018 Scopus |
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Singapore Singapore |
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| description |
10.1016/S0921-5107(00)00481-5 |
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PHYSICS |
| author_facet |
PHYSICS Lee, Y.K. Maung Latt, K. Li, S. Osipowicz, T. Chiam, S.Y. |
| format |
Article |
| author |
Lee, Y.K. Maung Latt, K. Li, S. Osipowicz, T. Chiam, S.Y. |
| spellingShingle |
Lee, Y.K. Maung Latt, K. Li, S. Osipowicz, T. Chiam, S.Y. Characterization of interfacial reactions between ionized metal plasma deposited Al-0.5 wt.% Cu and Ti on SiO2 |
| author_sort |
Lee, Y.K. |
| title |
Characterization of interfacial reactions between ionized metal plasma deposited Al-0.5 wt.% Cu and Ti on SiO2 |
| title_short |
Characterization of interfacial reactions between ionized metal plasma deposited Al-0.5 wt.% Cu and Ti on SiO2 |
| title_full |
Characterization of interfacial reactions between ionized metal plasma deposited Al-0.5 wt.% Cu and Ti on SiO2 |
| title_fullStr |
Characterization of interfacial reactions between ionized metal plasma deposited Al-0.5 wt.% Cu and Ti on SiO2 |
| title_full_unstemmed |
Characterization of interfacial reactions between ionized metal plasma deposited Al-0.5 wt.% Cu and Ti on SiO2 |
| title_sort |
characterization of interfacial reactions between ionized metal plasma deposited al-0.5 wt.% cu and ti on sio2 |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/95961 |
| _version_ |
1781786361214271488 |