Characterization of thick graded Si1-xGex/Si layers grown by low energy plasma enhanced chemical vapour deposition

Characterization of thick graded Si1-xGex/Si layers grown by low energy plasma enhanced chemical vapour deposition

10.1016/S0168-583X(03)01820-2

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Bibliographic Details
Main Authors: Seng, H.L., Breese, M.B.H., Watt, F., Kummer, M., Von Känel, H.
Other Authors: PHYSICS
Format: Article
Published: 2014
Subjects:
Beam bending
Graded silicon-germanium
Ion channeling
LEPECVD
Online Access:http://scholarbank.nus.edu.sg/handle/10635/95969
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Institution: National University of Singapore
Description
Summary:10.1016/S0168-583X(03)01820-2

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